氮化钪
化合物
氮化钪是一种无机化合物,化学式为ScN,由Sc3+和N3−构成。它可以由铟-钪熔体溶解氮气来制备[1],并在钨箔上通过升华和凝华来生长单晶。[2]氮化钪也是二氧化硅(SiO2)或二氧化铪(HfO2)底物上半导体的有效栅极。[3]
氮化钪 | |
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IUPAC名 Scandium nitride | |
别名 | 一氮化钪 |
识别 | |
CAS号 | 25764-12-9 |
PubChem | 117629 |
ChemSpider | 105117 |
SMILES |
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性质 | |
化学式 | ScN |
摩尔质量 | 58.963 g·mol⁻¹ |
密度 | 4.4 g/cm3 |
熔点 | 2900 °C(3173 K) |
危险性 | |
GHS危险性符号 | |
GHS提示词 | Danger |
H-术语 | H228 |
若非注明,所有数据均出自标准状态(25 ℃,100 kPa)下。 |
参考文献
- ^ Zhang, Guodong; Kawamura, Fumio; Oshima, Yuichi; Villora, Encarnacion; Shimamura, Kiyoshi. Synthesis of Scandium Nitride Crystals from Indium–Scandium Melts. Applied Ceramic Technology. 4 August 2016, 13 (6): 1134–1138. doi:10.1111/ijac.12576.
- ^ Gu, Zheng; Edgar, J H; Pomeroy, J; Kuball, M; Coffey, D W. Crystal Grown and Properties of Scandium Nitride. Journal of Materials Science: Materials in Electronics. August 2004, 15 (8): 555–559. doi:10.1023/B:JMSE.0000032591.54107.2c.
- ^ Yang, Hyundoek; Heo, Sungho; Lee, Dongkyu; Choi, Sangmoo; Hwang, Hyunsang. Effective Work Function of Scandium Nitride Gate Electrodes on SiO2 and HfO2. Japanese Journal of Applied Physics. 13 January 2006, 45 (2): L83–L85. doi:10.1143/JJAP.45.L83.